The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
Feb. 25, 2011
Hirofumi Funabashi, Nagoya, JP;
Yutaka Nonomura, Nagoya, JP;
Yoshiyuki Hata, Aichi-gun, JP;
Motohiro Fujiyoshi, Seto, JP;
Teruhisa Akashi, Nagoya, JP;
Yoshiteru Omura, Seto, JP;
Hirofumi Funabashi, Nagoya, JP;
Yutaka Nonomura, Nagoya, JP;
Yoshiyuki Hata, Aichi-gun, JP;
Motohiro Fujiyoshi, Seto, JP;
Teruhisa Akashi, Nagoya, JP;
Yoshiteru Omura, Seto, JP;
Kabushiki Kaisha Toyota Chuo Kenkyusho, Aichi, JP;
Abstract
In a MEMS structure, a first trench which penetrates the first layer, the second layer and the third layer is formed, and a second trench which penetrates the fifth layer, the forth layer and the third layer is formed. The first trench forms a first part of an outline of the movable portion in a view along the stacked direction. The second trench forms a second part of the outline of the movable portion in the view along the stacked direction. At least a part of the first trench overlaps with the first extending portion in the view along the stacked direction.