The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2014

Filed:

Oct. 19, 2011
Applicants:

Tsutomu Akechi, Shiga, JP;

Mamoru Kitamura, Shiga, JP;

Inventors:

Tsutomu Akechi, Shiga, JP;

Mamoru Kitamura, Shiga, JP;

Assignee:

Toyobo Co., Ltd., Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B60R 21/235 (2006.01); D06M 15/643 (2006.01); D03D 1/02 (2006.01); D03D 13/00 (2006.01); D03D 15/00 (2006.01); B32B 27/28 (2006.01);
U.S. Cl.
CPC ...
D06M 15/643 (2013.01); B32B 27/283 (2013.01); D03D 1/02 (2013.01); B60R 2021/23514 (2013.01); B60R 21/235 (2013.01); D10B 2331/02 (2013.01); D10B 2331/04 (2013.01); D03D 13/008 (2013.01); D03D 15/00 (2013.01);
Abstract

The present invention provides a coated base fabric for an air bag which can ensure sufficient air permeability even when the coating amount of the resin is 20 g/mor less. A coated base fabric for an air bag wherein silicone resin is coated at least on one side of the woven fabric constituted from synthetic fiber filaments which is characterized in that the coating amount of the silicone resin is 20 g/mor less, film strength and film elongation of the resin are 3 MPa or more and 300% or more, respectively and air permeability of the coated base fabric under the pressure difference of 100 kPa is 0.02 L/cm/min or less.


Find Patent Forward Citations

Akechi, Tsutomu. (2014). Coated base fabric for air bags (U.S. Patent No. 8815757). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8815757

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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