The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2014

Filed:

Dec. 07, 2012
Applicants:

Hitachi Kokusai Electric Inc., Tokyo, JP;

L'air Liquide-societe Anonyme Pour L'etude ET L'exploitation Des Procedes George, Paris, FR;

Inventors:

Yoshiro Hirose, Toyama, JP;

Atsushi Sano, Toyama, JP;

Kazutaka Yanagita, Tsukuba, JP;

Katsuko Higashino, Newark, DE (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/02 (2006.01); H01L 21/318 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3185 (2013.01); H01L 21/02211 (2013.01); H01L 21/02183 (2013.01); H01L 21/02167 (2013.01); H01L 21/0228 (2013.01); H01L 21/02189 (2013.01); H01L 21/02186 (2013.01); H01L 21/02181 (2013.01); H01L 21/02178 (2013.01); H01L 21/02175 (2013.01);
Abstract

There is provided a method of manufacturing a semiconductor device, including: forming a film containing a specific element, nitrogen, and carbon on a substrate, by alternately performing the following steps a specific number of times: a step of supplying a source gas containing the specific element and a halogen element, to the substrate; and a step of supplying a reactive gas composed of three elements of carbon, nitrogen, and hydrogen and having more number of a carbon atom than the number of a nitrogen atom in a composition formula thereof, to the substrate.


Find Patent Forward Citations

Loading…