The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
Mar. 12, 2012
Jiping LI, Palo Alto, CA (US);
Aaron Muir Hunter, Santa Cruz, CA (US);
Bruce E. Adams, Portland, OR (US);
Theodore Moffitt, Hillsboro, OR (US);
Stephen Moffatt, St. Lawrence, GB;
Jiping Li, Palo Alto, CA (US);
Aaron Muir Hunter, Santa Cruz, CA (US);
Bruce E. Adams, Portland, OR (US);
Theodore Moffitt, Hillsboro, OR (US);
Stephen Moffatt, St. Lawrence, GB;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for implanting a semiconductor substrate with boron clusters. A substrate is implanted with octadecaborane by plasma immersion or ion beam implantation. The substrate surface is then annealed to completely dissociate and activate the boron clusters. The annealing may take place by melting the implanted regions or by a sub-melt annealing process.