The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 26, 2014

Filed:

Aug. 28, 2012
Applicants:

Steven P. Levitan, Pittsburgh, PA (US);

Samuel J. Dickerson, Pittsburgh, PA (US);

Donald M. Chiarulli, Pittsburgh, PA (US);

Inventors:

Steven P. Levitan, Pittsburgh, PA (US);

Samuel J. Dickerson, Pittsburgh, PA (US);

Donald M. Chiarulli, Pittsburgh, PA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/30 (2006.01); B03C 5/00 (2006.01); B03C 5/02 (2006.01); G01N 27/447 (2006.01); G01N 15/02 (2006.01); G01N 15/00 (2006.01); B01L 3/00 (2006.01);
U.S. Cl.
CPC ...
G01N 27/447 (2013.01); B01L 2300/0819 (2013.01); B03C 5/005 (2013.01); B03C 5/026 (2013.01); G01N 15/0266 (2013.01); G01N 2015/0038 (2013.01); G01N 2015/0288 (2013.01); B01L 2300/0645 (2013.01); B01L 2400/0415 (2013.01); B01L 2300/0636 (2013.01); B01L 3/502715 (2013.01); G01N 15/0205 (2013.01); B01L 2200/0647 (2013.01); B01L 3/502761 (2013.01); B03C 2201/26 (2013.01);
Abstract

Systems, devices, and methods are presented that facilitate electronic manipulation and detection of submicron particles. A particle manipulation device contains a plurality of electrodes formed on an active semiconductor layer of an integrated circuit chip, where the electrodes and gap spacing between adjacent electrodes is submicron in size. The chip is oriented with its substrate face up, and at least a portion of the substrate is removed from the chip so the electrodes are in close proximity to a fluid chamber(s) placed over the chip, to facilitate manipulation of particles, contained in a buffer solution in the fluid chamber(s), to form a defined pattern. Innovative macro-scale optical detection is employed to detect the submicron particles, where a light beam is applied to the defined pattern, and interaction of the defined pattern with the light beam is detected and evaluated to facilitate detecting the particles.


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