The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2014
Filed:
Jul. 20, 2011
Jeffrey Drue David, San Jose, CA (US);
Xiaoyuan HU, Milpitas, CA (US);
Zhize Zhu, Cupertino, CA (US);
Harry Q. Lee, Los Altos, CA (US);
Jeffrey Drue David, San Jose, CA (US);
Xiaoyuan Hu, Milpitas, CA (US);
Zhize Zhu, Cupertino, CA (US);
Harry Q. Lee, Los Altos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of polishing includes polishing a substrate, receiving an identification of a selected spectral feature to monitor during polishing, measuring a sequence of spectra of light reflected from the substrate while the substrate is being polished, determining a location value and an associated intensity value of the selected spectral feature for each of the spectra in the sequence of spectra to generate a sequence of coordinates, and determining at least one of a polishing endpoint or an adjustment for a polishing rate based on the sequence of coordinates. At least some of the spectra of the sequence differ due to material being removed during the polishing, and the coordinates are pairs of location values and associated intensity values.