The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2014

Filed:

Jul. 31, 2012
Applicants:

Jonathan W. Brandt, Santa Cruz, CA (US);

Zhe Lin, Fremont, CA (US);

Vuong Le, Urbana, IL (US);

Inventors:

Jonathan W. Brandt, Santa Cruz, CA (US);

Zhe Lin, Fremont, CA (US);

Vuong Le, Urbana, IL (US);

Assignee:

Adobe Systems Incorporated, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/40 (2006.01); G06K 9/36 (2006.01); G06T 5/00 (2006.01);
U.S. Cl.
CPC ...
G06K 9/00248 (2013.01); G06T 5/005 (2013.01);
Abstract

Various embodiments of methods and apparatus for facial retouching are disclosed. In one embodiment, a face in an input image is detected. Independent sets of feature points are detected for respective facial feature components. A plurality of masks for each of the facial feature components is generated. Using the plurality of masks, retouch effects are performed to the facial feature components. Some embodiments provide for user interaction to constrain the mask generation.


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