The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2014

Filed:

Dec. 24, 2010
Applicants:

Paul Byron Hays, Ann Arbor, MI (US);

David Michael Zuk, Ann Arbor, MI (US);

Inventors:

Paul Byron Hays, Ann Arbor, MI (US);

David Michael Zuk, Ann Arbor, MI (US);

Assignee:

Michigan Aerospace Corporation, Ann Arbor, MI (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02 (2006.01); G01J 3/45 (2006.01); G01C 3/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A portion of a first portion of light (') from a source of light () is masked by a mask (), and the resulting masked first portion of light (″) is combined using a beam splitter optic () with at least one second portion of the light () that had been subject to scattering by a medium (″). The mask () is configured so that interference patterns () generated from the first and at least one second portions of light are substantially mutually exclusive even though those interference patterns () would otherwise overlap one another absent the mask ().


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