The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Jan. 31, 2013
Applicant:
Hewlett-packard Development Company, L.p., Houston, TX (US);
Inventors:
Steven J Barcelo, Palo Alto, CA (US);
Zhiyong Li, Redwood City, CA (US);
Gary Gibson, Palo Alto, CA (US);
Mineo Yamakawa, Campbell, CA (US);
Ansoon Kim, Palo Alto, CA (US);
Assignee:
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/16 (2006.01); G01L 1/24 (2006.01);
U.S. Cl.
CPC ...
G01L 1/24 (2013.01); G01B 11/16 (2013.01); G01L 1/241 (2013.01);
Abstract
A strain gauge or other device may include a deformable medium and discrete plasmon supporting structures arranged to create one or more plasmon resonances that change with deformation of the medium and provide the device with an optical characteristic that indicates the deformation of the medium.
Barcelo, Steven. (2014). Plasmon resonance based strain gauge (U.S. Patent No. 8810780). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8810780
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile