The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Jul. 19, 2013
Bu Gon Shin, Daejeon, KR;
Sin Young Kim, Daejeon, KR;
Jae Jin Kim, Daejeon, KR;
Da MI Lee, Daejeon, KR;
Bu Gon Shin, Daejeon, KR;
Sin Young Kim, Daejeon, KR;
Jae Jin Kim, Daejeon, KR;
Da Mi Lee, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
A mask and an optical filter manufacturing apparatus including the same are provided. A mask used for a roll-to-roll process of forming patterns in a base film configured to move along a curved surface includes a mask body having a curved surface disposed opposite a roll around which the base film is wound and a plane surface corresponding to the reverse side of the curved surface. The curved surface of the mask body is disposed a predetermined distance apart from a curved surface of the roll. The mask and optical filter manufacturing apparatus enable formation of uniform patterns on the base film to enhance the quality of products and precisely attain the properties of the base film.