The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2014

Filed:

Oct. 13, 2005
Applicant:

Masanori Haba, Machida, JP;

Inventor:

Masanori Haba, Machida, JP;

Assignee:

Pureron Japan Co., Ltd., Fukushima, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided is a method for uniformly producing a carbon film at a low cost with low power consumption. The method for producing a carbon film, including: a step of disposing a cylindrical member having an opening in part thereof in a vacuum chamber;


Find Patent Forward Citations

Haba, Masanori. (2014). Apparatus and method for producing carbon film using plasma cvd and carbon film (U.S. Patent No. 8808856). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8808856

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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