The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Aug. 30, 2010
Hiroshi Kawarada, Tokyo, JP;
Ryogo Kato, Tokyo, JP;
Toshiyuki Ohashi, Saitama, JP;
Toshio Tokune, Saitama, JP;
Hidefumi Nikawa, Saitama, JP;
Hiroshi Kawarada, Tokyo, JP;
Ryogo Kato, Tokyo, JP;
Toshiyuki Ohashi, Saitama, JP;
Toshio Tokune, Saitama, JP;
Hidefumi Nikawa, Saitama, JP;
Honda Motor Co., Ltd., Tokyo, JP;
Waseda University, Tokyo, JP;
Abstract
Disclosed is a method capable of accelerating the growth of oriented carbon nanotubes when manufacturing the oriented carbon nanotubes by a plasma CVD. Under the circulation of a gas which is the raw material of the carbon nanotubes, plasma is generated by an antenna () provided in a depressurized treatment chamber (), and substrates () provided with a reaction prevention layer and a catalyst material layer which are formed on a base material are held at a distance, to which a radical can reach and an attack of an ion generated as a by-product of the radical can be avoided, from a plasma generation area (). The tip () of the antenna () can be controlled so as to match with the position of the anti-node of a stationary wave () of microwaves.