The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Aug. 20, 2009
Koji Ikuta, Aichi, JP;
Masashi Ikeuchi, Aichi, JP;
Koji Ikuta, Aichi, JP;
Masashi Ikeuchi, Aichi, JP;
Japan Science and Technology Agency, Saitama, JP;
Abstract
The formation in quantity of various different populations of a substance being studied with multiple combinations of distribution form and distribution density by dripping a suspension of a single concentration of the substance onto a masking member of a certain specified structure placed on a substrate by making use of the sedimentation of said substance. A method to form populations of fine particles or molecules on a substrate by specifying the distribution form and distribution surface density, wherein a masking member provided with parallel through-holes and having a tilted wall structure to achieve the target distribution form and distribution density is prepared; a solution or a suspension of the substance being studied is dripped onto said masking member; and the substance settles through the region defined by the tilted wall structure of the masking member; and the result is that the substance settles along the tilted wall structure and passes through the region bounded by the upper boundary of said wall structure and deposits onto the substrate in the area bounded by the lower boundary of the wall structure.