The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 19, 2014
Filed:
Jul. 31, 2012
Applicants:
Samuel Chen, Penfield, NY (US);
Mark C. Rzadca, Fairport, NY (US);
Inventors:
Samuel Chen, Penfield, NY (US);
Mark C. Rzadca, Fairport, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B41J 29/393 (2006.01); B41J 29/38 (2006.01); B41J 2/21 (2006.01); G06K 9/36 (2006.01);
U.S. Cl.
CPC ...
B41J 29/393 (2013.01); B41J 29/38 (2013.01); B41J 2/2146 (2013.01); G06K 9/36 (2013.01);
Abstract
A method for monitoring stitching between two adjacent printheads includes capturing one or more images of content printed on a moving print media in at least a stitch boundary or overlap region to obtain pixel data. The pixel data is then averaged in a media transport direction to produce blur in an image or images. Derivative data of the averaged pixel data is determined and one or more peaks is detected in the derivative data. A type of stitching artifact is determined based on the detected peak in the derivative data.