The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 19, 2014

Filed:

Apr. 27, 2010
Applicants:

Yonglin Xie, Pittsford, NY (US);

John A. Lebens, Rush, NY (US);

Charles F. Faisst, Avon, NY (US);

Inventors:

Yonglin Xie, Pittsford, NY (US);

John A. Lebens, Rush, NY (US);

Charles F. Faisst, Avon, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B21D 53/76 (2006.01); B23P 17/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of manufacturing a printhead includes providing a substrate and a filter membrane structure. A first portion of the substrate defines a plurality of nozzles and a second portion of the substrate defines a plurality of liquid chambers. Each liquid chamber of the plurality of liquid chambers is in fluid communication with a respective one of the plurality of nozzles. The filter membrane structure is adhered, for example, laminated, to the second portion of the substrate. Each liquid chamber of the plurality of liquid chambers is in fluid communication with a distinct portion of the filter membrane structure. Pores are formed in the filter membrane structure using a photo-lithography process.


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