The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Mar. 22, 2013
Texas Instruments Incorporated, Dallas, TX (US);
Ashesh Parikh, Frisco, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A method of computational lithography includes collecting a critical dimension (CD) data set including CD data from printing a test structure including a set of gratings which provide a plurality of feature types including different ratios of line width to space width, where the printing includes a range of different focus values. The CD data is weighted to form a weighted CD data set using a weighting algorithm (WA) that assigns cost weights to the CD data based its feature type and its magnitude of CD variation with respect to a CD value for its feature type at a nominal focus (nominal CD). The WA algorithm reduces a value of the cost weight as the magnitude of variation increases. At least one imaging parameter is extracted from the weighted CD data set. A computational lithography model is automatically calibrated using the imaging parameter(s).