The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2014

Filed:

Sep. 23, 2011
Applicants:

Ho-ki Lee, Anyang-si, KR;

Kye-hyun Baek, Suwon-si, KR;

Young-cheul Lee, Suwon-si, KR;

Gyung-jin Min, Seongnam-si, KR;

Inventors:

Ho-ki Lee, Anyang-si, KR;

Kye-hyun Baek, Suwon-si, KR;

Young-cheul Lee, Suwon-si, KR;

Gyung-jin Min, Seongnam-si, KR;

Assignee:

Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2011.01); G05B 21/00 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
G05B 21/00 (2013.01); G05B 2219/32187 (2013.01); G05B 2219/45031 (2013.01); H01L 21/67253 (2013.01);
Abstract

A method of controlling process distribution of a semiconductor process includes receiving process distribution data representing the process distribution of the semiconductor process, receiving a parameter related to the process distribution, generating a virtual metrology model corresponding to the process distribution based on a relationship between the process distribution data and the parameter, and modifying a process variable affecting the process distribution based on the virtual metrology model.


Find Patent Forward Citations

Loading…