The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Apr. 24, 2012
Rodney Ray Bucks, Webster, NY (US);
Rodney Ray Bucks, Webster, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
Methods are provided in which a charge pattern is formed with a second area having a surface potential that is at least 30 percent lower than a surface potential of an adjacent first area that creates an inter-area field between the first area and second area that extends into a portion of the first area. A development station applies a first development field and a first toner is partially developed in the first area based upon the influence of the inter-area and first development fields. The charge pattern and first toner are further developed with a different second toner. The surface charge has a different polarity than a polarity of the first toner and second toner.