The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Nov. 15, 2010
Qihong Wu, Somerset, NJ (US);
Kelvin Xu Zhang, Pine Brook, NJ (US);
Shiaw-wen Tai, Livingston, NJ (US);
Qihong Wu, Somerset, NJ (US);
Kelvin Xu Zhang, Pine Brook, NJ (US);
Shiaw-Wen Tai, Livingston, NJ (US);
Polarization Solutions, LLC, Somerset, NJ (US);
Abstract
A method includes providing a layer having a plurality of spaced-apart lines of a first material extending along a first direction and forming a line of a second material on opposing surfaces of each line of the first material, the first and second materials being different and adjacent lines of the second material being discontinuous. After forming the lines of the second material, forming pairs of spaced-apart lines of a third material between adjacent pairs of the lines of the second material, wherein each line of the third material is spaced apart from the closest line of the second material and the first and third materials are different.