The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 12, 2014

Filed:

Dec. 17, 2010
Applicants:

Dong Seok Baek, Suwon-si, KR;

Sang Don Jang, Suwon-si, KR;

Ho Seok Choi, Suwon-si, KR;

HI Kuk Lee, Yongin-si, KR;

Oui Serg Kim, Seongnam-si, KR;

Inventors:

Dong Seok Baek, Suwon-si, KR;

Sang Don Jang, Suwon-si, KR;

Ho Seok Choi, Suwon-si, KR;

Hi Kuk Lee, Yongin-si, KR;

Oui Serg Kim, Seongnam-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

Example embodiments are directed to a maskless exposure apparatus that generates and/or corrects exposure data using at least one information of intensity information, central position information, focus information, and/or shape information of a plurality of beams acquired using a measurement optical unit, and a control method thereof. The maskless exposure apparatus includes the measurement optical unit including a photo sensor and an image sensor, and a control unit configured to generate and/or correct the exposure data using the information acquired by the measurement optical unit.


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