The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Dec. 20, 2010
Applicants:
Sagi Katz, Yokneam Ilit, IL;
Avishai Adler, Haifa, IL;
Giora Yahav, Haifa, IL;
John Tardif, Sammamish, WA (US);
Inventors:
Sagi Katz, Yokneam Ilit, IL;
Avishai Adler, Haifa, IL;
Giora Yahav, Haifa, IL;
John Tardif, Sammamish, WA (US);
Assignee:
Microsoft Corporation, Redmond, WA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04N 13/02 (2006.01); A63F 13/06 (2006.01); G01S 17/89 (2006.01); G01S 17/87 (2006.01);
U.S. Cl.
CPC ...
A63F 13/06 (2013.01); G01S 17/89 (2013.01); G01S 17/87 (2013.01); A63F 2300/1087 (2013.01);
Abstract
A depth-mapping method comprises exposing first and second detectors oriented along different optical axes to light dispersed from a scene, and furnishing an output responsive to a depth coordinate of a locus of the scene. The output increases with an increasing first amount of light received by the first detector during a first period, and decreases with an increasing second amount of light received by the second detector during a second period different than the first.