The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Apr. 30, 2012
Jae-won Lee, Gyeonggi-Do, KR;
Ki-yong Kim, Gyeonggi-Do, KR;
Jae Young OH, Gyeonggi-Do, KR;
Yong-su an, Gyeonggi-Do, KR;
Sung-ki Kim, Gyeonggi-Do, KR;
Gi-sang Hong, Gyeonggi-Do, KR;
Jin-bok Lee, Gyeonggi-Do, KR;
Sang-hyuk Won, Gyeonggi-Do, KR;
Dong-kyu Lee, Jeollabuk-Do, KR;
Jae-Won Lee, Gyeonggi-Do, KR;
Ki-Yong Kim, Gyeonggi-Do, KR;
Jae Young Oh, Gyeonggi-Do, KR;
Yong-Su An, Gyeonggi-Do, KR;
Sung-Ki Kim, Gyeonggi-Do, KR;
Gi-Sang Hong, Gyeonggi-Do, KR;
Jin-Bok Lee, Gyeonggi-Do, KR;
Sang-Hyuk Won, Gyeonggi-Do, KR;
Dong-Kyu Lee, Jeollabuk-Do, KR;
LG Display Co., Ltd., Seoul, KR;
Abstract
A method for fabricating a process substrate includes: providing a first substrate; providing a substrate and an auxiliary substrate; contacting the substrate and the auxiliary substrate with each other in a vacuum state, thereby forming micro spaces of a vacuum state between the substrate and the auxiliary substrate; and increasing a pressure at the outside of the contacted substrate and auxiliary substrate to attach the substrate and the auxiliary substrate to each other by a pressure difference between the micro spaces and the outside of the contacted substrate and auxiliary substrate.