The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Nov. 06, 2012
Innocom Technology(shenzhen)co., Ltd., Longhua Town, TW;
Chimei Innolux Corporation, Miao-Li County, TW;
Yao-Jen Ou, Miao-Li County, TW;
Han-Lang Lee, Miao-Li County, TW;
Chien-Chih Wang, Miao-Li County, TW;
Hung-I Tseng, Miao-Li County, TW;
Innocom Technology (Shenzhen) Co., Ltd., Longhua Town, Shenzhen, CN;
Innolux Corporation, Miao-Li County, TW;
Abstract
A method of forming an alignment film is provided. A photosensitive polymer material is provided, wherein the photosensitive polymer material defines a first pixel area and a second pixel area respectively defining a first sub-pixel area and the second sub-pixel area. In a first exposure, the photosensitive polymer material is irradiate by a first exposure light and a second exposure light to form a first alignment portion and a second alignment portion with different alignment directions in the first sub-pixel of the first pixel area and the second sub-pixel of the second pixel area respectively. In a second exposure, the photosensitive polymer material is irradiated with the first exposure light and the second exposure light to form a third alignment portion and a fourth alignment portion with different alignment directions in the first sub-pixel of the second pixel area and the second sub-pixel of the first pixel area respectively.