The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
May. 13, 2013
International Business Machines Corporation, Armonk, NY (US);
Charles T. Black, New York, NY (US);
Christopher B. Murray, Ossining, NY (US);
Robert L. Sandstrom, Chestnut Ridge, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
One-dimensional materials are prepared from an array of nanoparticles positioned in one or more recesses of a substrate, wherein the recesses and the positioned nanoparticles have a comparable diameter of the same order of magnitude such that one nanoparticle is positioned within each of the one or more recesses; wherein a depth of the one or more recesses is from 10 nm to 40 nm; and wherein a diameter of the one or more recesses is adjusted by conformal film deposition and is between one and two times the mean diameter of the nanoparticles, and wherein the nanoparticles have a mean diameter of from 1 nm to 50 nm, and wherein the nanoparticles are catalytic sites for the growth of the one-dimensional materials; wherein the one dimensional materials are non-aggregated and extend in a direction that is perpendicular or approximately perpendicular to the horizontal surface of the substrate.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile