The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Sep. 13, 2007
Isao Yanagisawa, Chino, JP;
Yasuo Inaoka, Shiojiri, JP;
Takuma Okamuro, Fujimi-maci, JP;
Kazutoshi Goto, Matsumoto, JP;
Isao Yanagisawa, Chino, JP;
Yasuo Inaoka, Shiojiri, JP;
Takuma Okamuro, Fujimi-maci, JP;
Kazutoshi Goto, Matsumoto, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
An alignment method includes: disposing an alignment mark provided to a positioned member and a reference mark provided to a surface of an alignment mask so that the alignment mark and the reference mark can face each other; capturing an image from the other surface side of the alignment mask, which is the opposite surface of the alignment mask from the surface where the reference mark is disposed, the image concurrently showing the alignment mark and the reference mark; performing a surface treatment on at least a region of the positioned member side of the alignment mask, which is captured as the image, rather than on the reference mark side thereof, the surface treatment providing a high contrast ratio to each alignment mark and reference mark on the captured image; and thereafter aligning the alignment mark with the reference mark, while checking the image.