The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 12, 2014
Filed:
Mar. 01, 2011
Takashi Katsuki, Kawasaki, JP;
Takeaki Shimanouchi, Kawasaki, JP;
Masahiko Imai, Kawasaki, JP;
Osamu Toyoda, Kawasaki, JP;
Satoshi Ueda, Kawasaki, JP;
Takashi Katsuki, Kawasaki, JP;
Takeaki Shimanouchi, Kawasaki, JP;
Masahiko Imai, Kawasaki, JP;
Osamu Toyoda, Kawasaki, JP;
Satoshi Ueda, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
There is provided a method for fabricating a device, preferably for a micro electro electro mechanical system. The method includes forming a first electrode on a substrate, where the first electrode has a first sloped end at least at one end thereof; forming a sacrificial layer on the first electrode, where the sacrificial layer has a first sloped edge, the first sloped edge and the first sloped end are overlapped each other so that a thickness of the first sloped edge decreases as a thickness of the first sloped end increases; forming a first spacer on the first electrode, where the first spacer has contact with the first sloped edge; forming a beam electrode on the sacrificial layer and the first spacer; and removing the sacrificial layer after the forming the beam electrode.