The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Nov. 30, 2012
Hgst Netherlands B.v., Amsterdam, NL;
Eric W. Flint, San Jose, CA (US);
Cherngye Hwang, San Jose, CA (US);
Randall G. Simmons, San Jose, CA (US);
HGST Netherlands B.V., Amsterdam, NL;
Abstract
A magnetic slider for magnetic data recording constructed by a process that allows for careful control of seed layer and overcoat thickness. The slider is treated by a process that result in surface pits and scratches. A refill layer is used to fill in the pits and scratches, the refill layer being constructed of a material that does not include Si or carbon. An angled ion beam etching can be used to remove portions of the refill layer that extend outside of the pits and scratches. Then, a seed layer comprising Si and a protective layer comprising C are deposited over the surface. Because the refill layer does not contain either of Si or C, the thickness of the seed layer and carbon overcoat can be acurately measured and controlled, without the refill layer being mistaken for seed or overcoat material.