The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Jan. 22, 2012
Applicants:
David R. Demmer, Toronto, CA;
Thomas L. Haslett, Toronto, CA;
Joseph L. Dallas, Maple Glen, PA (US);
Inventors:
David R. Demmer, Toronto, CA;
Thomas L. Haslett, Toronto, CA;
Joseph L. Dallas, Maple Glen, PA (US);
Assignee:
Ocean Optics, Inc., Dunedin, FL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 3/28 (2006.01); G02B 26/02 (2006.01); G01J 3/04 (2006.01); G01J 3/02 (2006.01); G01J 3/18 (2006.01);
U.S. Cl.
CPC ...
G01J 3/0256 (2013.01); G01J 3/04 (2013.01); G01J 3/0291 (2013.01); G01J 3/0208 (2013.01); G01J 3/0229 (2013.01); G01J 3/18 (2013.01); G01J 3/0286 (2013.01);
Abstract
A spectrometer design method that corrects aberration by using crossed optical paths and minor alignment, simplifies manufacture by applying the light entrance slit and aperture on opposite sides of a transparent input block, and creates a more compact footprint by placing a 45 degree mirror or right angle prism directly in front of the detector is disclosed.
Demmer, David. (2014). Spectrometer design for aberration correction, simplified manufacture, and compact footprint (U.S. Patent No. 8797529). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8797529
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile