The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2014

Filed:

May. 24, 2011
Applicant:

Takashi Sugimoto, Yokohama, JP;

Inventor:

Takashi Sugimoto, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01L 1/24 (2006.01); G01B 11/24 (2006.01); G01B 11/30 (2006.01); G01B 11/02 (2006.01); G01B 9/02 (2006.01); G01B 11/16 (2006.01);
U.S. Cl.
CPC ...
G01B 9/02095 (2013.01); G01B 11/162 (2013.01);
Abstract

An apparatus and a method capable of measuring large deformation with a high accuracy and dynamically, using speckle interference, utilizes an optical path where one laser beam out of two laser beams becomes non-collimated light and a plane parallel transparent plate, and can form carrier fringes. More specifically, the transparent plate is arranged on the optical path where the non-collimated light is formed, or is removed from the optical path, or a refractive index, or a thickness of the transparent plate arranged on the optical path, or a tilt angle relative to an optical axis is changed. The phase analysis can be performed from fringe images corresponding to the deformation, by performing repetitively the above-described processing and acquisition of the speckle interference pattern.


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