The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2014

Filed:

Apr. 17, 2012
Applicants:

Hiroyuki Nagasaka, Kumagaya, JP;

Takeshi Okuyama, Yokohama, JP;

Inventors:

Hiroyuki Nagasaka, Kumagaya, JP;

Takeshi Okuyama, Yokohama, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/52 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70341 (2013.01);
Abstract

A liquid immersion exposure apparatus and method exposes a substrate. The apparatus includes a projection optical system having an optical element via which exposure light is projected through liquid and a member having a channel in which the liquid flows. The member has an opening through which the exposure light passes. A gap is formed between a first surface of the member and a second surface of at least one of the optical element and a holding component which holds the optical element, and at least a portion of one or both of the first surface and the second surface is liquid repellent.


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