The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Oct. 21, 2008
Coen Adrianus Johannes Verschuren, Eindhoven, NL;
Josephus Arnoldus Henricus Maria Kahlman, Tilburg, NL;
Albert Hendrik Jan Immink, Eindhoven, NL;
Mischa Megens, Eindhoven, NL;
Jeroen Veen, Eindhoven, NL;
Bart Michiel DE Boer, Eindhoven, NL;
Theodorus Petrus Henricus Gerardus Jansen, Eindhoven, NL;
Coen Adrianus Johannes Verschuren, Eindhoven, NL;
Josephus Arnoldus Henricus Maria Kahlman, Tilburg, NL;
Albert Hendrik Jan Immink, Eindhoven, NL;
Mischa Megens, Eindhoven, NL;
Jeroen Veen, Eindhoven, NL;
Bart Michiel De Boer, Eindhoven, NL;
Theodorus Petrus Henricus Gerardus Jansen, Eindhoven, NL;
Koninklijke Philips N.V., Eindhoven, NL;
Abstract
A sensor device and a method for the determination of the amount of target particles at a contact surface adjacent to a sample chamber include detecting, by a detector, the target particles in the sample chamber by a sensor element, and providing at least one corresponding sensor signal. An evaluation unit determines the amount of target particles in a first zone at the contracts surface and in a second zone a distance away from the contact surface based on this sensor signal. In an optical measurement approach, frustrated total internal reflection taking place under different operating conditions, such as wavelength and/or angle of incidence, may be used to extract information about the first and second zones. In a magnetic measurement approach, different magnetic excitation fields may be used to excite magnetic target particles differently in the first and second zone.