The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 05, 2014

Filed:

Sep. 04, 2007
Applicants:

J. Gary Eden, Mahomet, IL (US);

Ju Gao, Champaign, IL (US);

Sung-o Kim, Champaign, IL (US);

Inventors:

J. Gary Eden, Mahomet, IL (US);

Ju Gao, Champaign, IL (US);

Sung-o Kim, Champaign, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 17/49 (2012.01); H01J 17/04 (2012.01);
U.S. Cl.
CPC ...
Abstract

An AC, rf, or pulse-excited microdischarge device and array are provide by the invention. A preferred array includes a substrate. A plurality of microdischarge cavities that contain discharge medium are in the substrate. A transparent layer seals the discharge medium in the microdischarge cavites. Electrodes stimulate the discharge medium. The microdischarge cavities are physically isolated from the electrodes by dielectric and arranged relative to the electrodes such that ac, rf, or pulsed excitation applied to the electrodes stimulates plasma excitation of the discharge medium. The microdischarge cavities are sized to produce plasma within the microdischarge cavities.


Find Patent Forward Citations

Loading…