The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Sep. 23, 2011
Soo-ryun Cho, Gunpo-si, KR;
Jun Woo Lee, Seongnam-si, KR;
Kyoung Tae Kim, Osan-si, KR;
Joo Seok Yeom, Seoul, KR;
Suk Hoon Kang, Seoul, KR;
Eun Ju Kim, Suwon-si, KR;
Soo-Ryun Cho, Gunpo-si, KR;
Jun Woo Lee, Seongnam-si, KR;
Kyoung Tae Kim, Osan-si, KR;
Joo Seok Yeom, Seoul, KR;
Suk Hoon Kang, Seoul, KR;
Eun Ju Kim, Suwon-si, KR;
Samsung Display Co., Ltd., , KR;
Abstract
An exposure apparatus for a photoalignment process includes; a first photomask including a plurality of transmission parts; and a second photomask including a plurality of transmission parts, where the first photomask and the second photomask partially overlap each other such that each of the first photomask and the second photomask includes an overlapping region and a non-overlapping region, the overlapping region of at least one of the first photomask and the overlapping region of the second photomask includes at least two subregions, and shapes or arrangements of the transmission parts in the at least two subregions are different from each other.