The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Sep. 23, 2011
Su MI Lee, Hwaseong-si, KR;
Mio Hyuck Kang, Seoul, KR;
Eun-ae Kwak, Gunpo-si, KR;
Moon Gyu Lee, Suwon-si, KR;
Bong-jin Moon, Seoul, KR;
Joona Bang, Seoul, KR;
Hyun Jung Jung, Seoul, KR;
Su Mi Lee, Hwaseong-si, KR;
Mio Hyuck Kang, Seoul, KR;
Eun-Ae Kwak, Gunpo-si, KR;
Moon Gyu Lee, Suwon-si, KR;
Bong-Jin Moon, Seoul, KR;
Joona Bang, Seoul, KR;
Hyun Jung Jung, Seoul, KR;
Samsung Display Co., Ltd., Yongin, Gyeonggi-Do, KR;
Korea University Research and Business Foundation, Seoul, KR;
Abstract
A method of forming patterns includes forming a layer composed of a ketene based random copolymer on a substrate, forming a block copolymer on the ketene based random copolymer layer and patterning the ketene based random copolymer layer by removing a part of the block copolymer and a portion of the ketene based random copolymer layer.