The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Aug. 27, 2010
Artin Petrossians, Glendale, CA (US);
Artak Arakelian, Los Angeles, CA (US);
James D. Weiland, Valencia, CA (US);
Florian B. Mansfeld, Los Angeles, CA (US);
John J. Whalen, Iii, Los Angeles, CA (US);
Artin Petrossians, Glendale, CA (US);
Artak Arakelian, Los Angeles, CA (US);
James D. Weiland, Valencia, CA (US);
Florian B. Mansfeld, Los Angeles, CA (US);
John J. Whalen, III, Los Angeles, CA (US);
University of Southern California, Los Angeles, CA (US);
Abstract
Aspects of the present disclosure are directed to electrochemical approaches for synthesis of platinum-iridium alloys with selected platinum-iridium ratio content and subsequently predetermined mechanical properties and electrochemical impedance properties. Such can provide a simple and cost-effective process for preparing these electrodes, as compared to conventional thin film processing techniques. A three-electrode electrochemical electrodeposition system is described including an electrochemical cell with a working electrode on which the electrodeposited film is deposited, a counter electrode to complete the electrochemical circuit and a reference electrode to measure and control surface potential. Mixed layers of platinum atoms and iridium atoms can be deposited from electrolyte solution onto the working electrode surface to create an electrically conductive surface with material properties related to the composition of the as-deposited film. The mechanical properties and electrochemical properties of the film can be tuned by adjusting the electrodeposition parameters.