The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2014
Filed:
Jan. 27, 2011
Brian Christopher Sapp, Hopewell Junction, NY (US);
Choongyeun Cho, Hopewell Junction, NY (US);
Lawrence A. Clevenger, Hopewell Junction, NY (US);
Laertis Economikos, Hopewell Junction, NY (US);
Bernhard R. Liegl, Hopewell Junction, NY (US);
Kevin S. Petrarca, Hopewell Junction, NY (US);
Roger Allan Quon, Hopewell Junction, NY (US);
Brian Christopher Sapp, Hopewell Junction, NY (US);
Choongyeun Cho, Hopewell Junction, NY (US);
Lawrence A. Clevenger, Hopewell Junction, NY (US);
Laertis Economikos, Hopewell Junction, NY (US);
Bernhard R. Liegl, Hopewell Junction, NY (US);
Kevin S. Petrarca, Hopewell Junction, NY (US);
Roger Allan Quon, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method and system to predict lithography focus error using chip topography data is disclosed. The chip topography data may be measured or simulated topography data. A plane is best fitted to the topography data, and residuals are computed. The residuals are then used to make a prediction regarding the focus error. The density ratio of metal to dielectric may also be used as a factor in determining the predicted focus error.