The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8791033 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 29, 2014

Filed:

Dec. 07, 2012
Applicant:

Henkel Corporation, Rocky Hill, CT (US);

Inventors:

Jeffrey Gasa, Long Beach, CA (US);

Dung Nghi Phan, Long Beach, CA (US);

Jeffrey Leon, Long Beach, CA (US);

Sharad Hajela, San Carlos, CA (US);

Shengqian Kong, Hillsborough, NJ (US);

Assignee:

Henkel IP & Holding GmbH, Duesseldorf, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/56 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process for coating a semiconductor wafer with a coating composition comprises curing the coating with a pulsed UV light, thereby preventing delamination during reflow operations. In a particular embodiment, the coating composition comprises both epoxy and acrylate resins. The epoxy resin can be cured thermally; the acrylate resin is cured by UV irradiation.


Find Patent Forward Citations

Gasa, Jeffrey. (2014). Wafer backside coating process with pulsed uv light source (U.S. Patent No. 8791033). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8791033

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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