The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2014
Filed:
Jan. 16, 2013
Showa Denko K.k., Tokyo, JP;
Makoto Hiwatari, Chiba, JP;
Akira Yamane, Ichihara, JP;
Tomoo Shige, Chiba, JP;
Akira Sakawaki, Kisarazu, JP;
Showa Denko K.K., Tokyo, JP;
Abstract
A method of manufacturing a magnetic recording medium is provided. The method includes: forming a magnetic layeron a non-magnetic substrate; forming a mask layeron the magnetic layer; forming a resist layerwhich is patterned into a predetermined shape on the mask layer; patterning the mask layerinto a shape corresponding to the resist layerusing the resist layer; patterning the magnetic layerinto a shape corresponding to the mask layerusing the patterned mask layer; and removing the mask layerthat remains on the magnetic layerby reactive plasma etching. The reactive plasma etching is performed under an atmosphere containing an organic compound having at least one kind or plural kinds of functional groups selected from a hydroxyl group, a carbonyl group, a hydroxy carbonyl group, an alkoxy group, and an ether group.