The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 29, 2014
Filed:
Nov. 12, 2006
Donny Young, San Jose, CA (US);
Alan Alexander Ritchie, Pleasanton, CA (US);
Ilyoung (Richard) Hong, San Jose, CA (US);
Kathleen A. Scheible, San Francisco, CA (US);
Donny Young, San Jose, CA (US);
Alan Alexander Ritchie, Pleasanton, CA (US);
Ilyoung (Richard) Hong, San Jose, CA (US);
Kathleen A. Scheible, San Francisco, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A process kit for a sputtering chamber comprises a deposition ring, cover ring, and a shield assembly, for placement about a substrate support in a sputtering chamber. The deposition ring comprising an annular band with an inner lip extending transversely, a raised ridge substantially parallel to the substrate support, an inner open channel, and a ledge radially outward of the raised ridge. A cover ring at least partially covers the deposition ring, the cover ring comprising an annular plate comprising a footing which rests on a surface about the substrate support, and downwardly extending first and second cylindrical walls.