The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 29, 2014

Filed:

Jan. 11, 2012
Applicants:

Chien-wei Chen, New Taipei, TW;

Ching-fu Hsu, New Taipei, TW;

Inventors:

Chien-Wei Chen, New Taipei, TW;

Ching-Fu Hsu, New Taipei, TW;

Assignee:

Wistron Corporation, Hsichih, New Taipei, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B29C 65/48 (2006.01); B29C 47/78 (2006.01); B29C 47/02 (2006.01); B32B 37/04 (2006.01); B32B 37/10 (2006.01); B32B 38/14 (2006.01); B41F 16/00 (2006.01); B29C 47/08 (2006.01);
U.S. Cl.
CPC ...
B41F 16/008 (2013.01);
Abstract

The present invention relates to a transfer printing method and a system using the method for printing images on a workpiece with supercritical fluid. The method includes disposing the workpiece inside the first mold and disposing a transfer film above the workpiece, closing the first mold with a second mold and injecting pressured gas, whose pressure is greater than a critical pressure, into the first mold and the second mold, ensuring a temperature of the pressured gas being greater than a critical temperature so as to convert into supercritical fluid, softening the transfer film with the supercritical fluid, transferring an adhesive layer, a print layer and a hardening layer of the transfer film onto the workpiece, and opening the first mold and the second mold to take out the workpiece.


Find Patent Forward Citations

Loading…