The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 29, 2014

Filed:

Mar. 25, 2013
Applicants:

Hiroto Sugahara, Ama, JP;

Shuhei Hiwada, Toyoake, JP;

Inventors:

Hiroto Sugahara, Ama, JP;

Shuhei Hiwada, Toyoake, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/045 (2006.01); H04R 17/00 (2006.01); B41J 2/14 (2006.01); B41J 2/16 (2006.01);
U.S. Cl.
CPC ...
B41J 2/14201 (2013.01); B41J 2/1621 (2013.01);
Abstract

There is provided a liquid jetting apparatus which includes: a liquid jetting head including a channel unit and a piezoelectric actuator, an elastic deformation layer arranged on the piezoelectric actuator, a plurality of head-side contact points arranged on the elastic deformation layer, a substrate arranged to face a surface of the liquid jetting head, a plurality of substrate-side contact points arranged on the substrate, and a fixing member fixing the liquid jetting head and the substrate. When the fixing member fixes the liquid jetting head and the substrate, a portion of the elastic deformation layer, on which the head-side contact points are arranged, is sandwiched by the piezoelectric actuator and the substrate to undergo elastic deformation. The elastic deformation layer is configured to press the plurality of head-side contact points onto the substrate-side contact points by a force arising from a tendency to restore a state before elastic deformation.


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