The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2014
Filed:
Oct. 27, 2011
Barry David Silverstein, Rochester, NY (US);
Joseph Raymond Bietry, Rochester, NY (US);
Andrew F. Kurtz, Macedon, NY (US);
Robert J. Metzger, Fairport, NY (US);
Barry David Silverstein, Rochester, NY (US);
Joseph Raymond Bietry, Rochester, NY (US);
Andrew F. Kurtz, Macedon, NY (US);
Robert J. Metzger, Fairport, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
An imaging system having reduced susceptibility to thermally-induced stress birefringence comprising relay optics and projection optics. One of either the relay optics or the projection optics is a reflective optical system that includes reflective optical elements, and the other is a refractive optical system having a negligible or low susceptibility to thermal stress birefringence. The refractive optical system includes: a first group of refractive lens elements located upstream from an aperture stop, and a second group of refractive lens elements located downstream from the aperture stop. The refractive lens elements in the first and second groups that are immediately adjacent to the aperture stop are fabricated using optical materials having a negligible susceptibility to thermal stress birefringence, and the other refractive lens elements in the first and second groups are fabricated using optical materials having at most a moderate susceptibility to thermal stress birefringence.