The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2014
Filed:
Oct. 07, 2009
Tae-hyung Hwang, Seoul, KR;
Hyun-jae Kim, Seoul, KR;
Doh-kyung Kim, Yongin-si, KR;
Tae-hun Jung, Seoul, KR;
Woong-hee Jeong, Seoul, KR;
Choong-hee Lee, Suwon-si, KR;
Tae-Hyung Hwang, Seoul, KR;
Hyun-Jae Kim, Seoul, KR;
Doh-Kyung Kim, Yongin-si, KR;
Tae-Hun Jung, Seoul, KR;
Woong-Hee Jeong, Seoul, KR;
Choong-Hee Lee, Suwon-si, KR;
Samsung Display Co., Ltd., , KR;
Abstract
Disclosed is a crystallization apparatus capable of locally crystallizing amorphous silicon. The crystallization apparatus includes a heat emission part, a support part and a roller. The heat emission part emits heat upon receiving a heat emission source. The support part supports the heat emission part and provides the heat emission source to the heat emission part. The roller receives the heat emission part and has at least one opening to provide heat to a target (e.g., amorphous silicon). Local crystallization is performed without causing damage to a substrate.