The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2014

Filed:

Aug. 21, 2012
Applicants:

Jong-hwa Lee, Uiwang-si, KR;

Hyun-yong Cho, Uiwang-si, KR;

Min-kook Chung, Uiwang-si, KR;

Ji-young Jeong, Uiwang-si, KR;

Myoung-hwan Cha, Uiwang-si, KR;

Inventors:

Jong-Hwa Lee, Uiwang-si, KR;

Hyun-Yong Cho, Uiwang-si, KR;

Min-Kook Chung, Uiwang-si, KR;

Ji-Young Jeong, Uiwang-si, KR;

Myoung-Hwan Cha, Uiwang-si, KR;

Assignee:

Cheil Industries Inc., Gumi-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0233 (2013.01);
Abstract

Disclosed is a photosensitive novolac resin including a structural unit represented by the following Chemical Formula 1 and structural unit represented by the following Chemical Formula 2, wherein R, R, R, and Rin Chemical Formulae 1 and 2 are the same as defined in the detailed description, a positive photosensitive resin composition including the same, a photosensitive resin film fabricated using the same, and a semiconductor device including the photosensitive resin composition.


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