The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2014

Filed:

Feb. 09, 2011
Applicants:

Do-young Kim, Yongin, KR;

Young-gil Kwon, Yongin, KR;

Seung-mook Lee, Yongin, KR;

Dae-hoon Kim, Yongin, KR;

Sun-hoe Kim, Yongin, KR;

Min-chul Suh, Yongin, KR;

Inventors:

Do-Young Kim, Yongin, KR;

Young-Gil Kwon, Yongin, KR;

Seung-Mook Lee, Yongin, KR;

Dae-Hoon Kim, Yongin, KR;

Sun-Hoe Kim, Yongin, KR;

Min-Chul Suh, Yongin, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2012.01);
U.S. Cl.
CPC ...
Abstract

A mask for laser induced thermal imaging and a method of fabricating an organic electro-luminescence display device using the mask. A mask includes a transparent substrate including a transmitting region; a reflective layer pattern on a first surface of the transparent substrate other than the transmitting region; and a scattering unit on at least one of the first surface or a second surface opposite the first surface of the transparent substrate, and the scattering unit is at a position corresponding to the reflective layer pattern. The mask can accurately irradiate a laser to a donor substrate and prevent or reduce damage of the laser generator due to the laser beam being reflected by the mask.


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