The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2014

Filed:

Jan. 30, 2009
Applicants:

Zhang-lin Zhou, Palo Alto, CA (US);

Chung Ching Yang, Saratoga, CA (US);

Lihua Zhao, Sunnyvale, CA (US);

Inventors:

Zhang-Lin Zhou, Palo Alto, CA (US);

Chung Ching Yang, Saratoga, CA (US);

Lihua Zhao, Sunnyvale, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 51/54 (2006.01); C09K 11/06 (2006.01); C08G 73/00 (2006.01); C08G 63/66 (2006.01); C08G 73/06 (2006.01); C08G 79/00 (2006.01); C08G 77/60 (2006.01); C08G 69/40 (2006.01); C08G 75/12 (2006.01); C08G 61/12 (2006.01); H01L 51/00 (2006.01); C08G 61/02 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0043 (2013.01); C08G 2261/3142 (2013.01); C08G 2261/3162 (2013.01); C08G 61/12 (2013.01); C08G 2261/314 (2013.01); C08G 2261/5222 (2013.01); C08G 2261/316 (2013.01); H01L 51/0039 (2013.01); C08G 61/02 (2013.01); Y10S 428/917 (2013.01);
Abstract

A fluorene-based copolymer of formula I includes a monomeric unit that includes a fluorene group and at least one steric hindering chemical group to provide sufficient steric interaction such that the spatial conformation of the fluorene-based copolymer is substantially non-planar. The fluorene-based copolymer exhibits UV light emission.


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