The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2014

Filed:

Mar. 30, 2011
Applicants:

Takeyuki Igarashi, Kurashiki, JP;

Yasuhiko Haneda, Tokyo, JP;

Masahiro Kitamura, Tokyo, JP;

Inventors:

Takeyuki Igarashi, Kurashiki, JP;

Yasuhiko Haneda, Tokyo, JP;

Masahiro Kitamura, Tokyo, JP;

Assignee:

Kuraray Co., Ltd., Kurashiki-shi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 33/00 (2006.01); B29D 22/00 (2006.01); B28B 23/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A multilayer structure, comprising: a layer of a resin composition (A); a layer of a saponified ethylene-vinyl acetate copolymer (B); and a layer of polyolefin (C) arranged on one side or both sides of those layers, wherein the resin composition (A) contains polyolefin (D), a saponified ethylene-vinyl acetate copolymer (E) and a saponified ethylene-vinyl acetate copolymer (F1) and/or an acid-modified ethylene-vinyl acetate copolymer (F2), the copolymer (E) has a mass ratio [E/(F1+F2)] of from 0.05 to 30, the polyolefin (D) has the copolymer (E) having an average particle diameter of from 0.1 to 1.8 μm dispersed in a matrix thereof, the layers of (A) and of (C) have thicknesses of from 50 to 1000 μm, and from 25 to 1000 μm, respectively, which enables provision of a multilayer structure having good gas barrier properties after retort processing and a good appearance.


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