The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2014
Filed:
Jan. 16, 2007
Applicants:
Prabhat Kumar, Framingham, MA (US);
Charles Wood, Coldwater, MI (US);
Gary Rozak, Akron, OH (US);
Steven A. Miller, Canton, MA (US);
Glen Zeman, Coldwater, MI (US);
Rong-chein Richard Wu, Chelmsford, MA (US);
Inventors:
Prabhat Kumar, Framingham, MA (US);
Charles Wood, Coldwater, MI (US);
Gary Rozak, Akron, OH (US);
Steven A. Miller, Canton, MA (US);
Glen Zeman, Coldwater, MI (US);
Rong-Chein Richard Wu, Chelmsford, MA (US);
Assignee:
H.C. Starck Inc., Newton, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 1/00 (2006.01); B22F 1/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention is directed to a process for producing high density, refractory metal products via a press/sintering process. The invention is also directed to a process for producing a sputtering target and to the sputtering target so produced.