The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2014
Filed:
Sep. 29, 2010
Applicant:
Chia-ling Hsu, Taipei Hsien, TW;
Inventor:
Chia-Ling Hsu, Taipei Hsien, TW;
Assignee:
Hon Hai Precision Industry Co., Ltd., New Taipei, TW;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/455 (2006.01); C23C 16/46 (2006.01); C23C 16/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45555 (2013.01); C23C 16/46 (2013.01); C23C 16/45525 (2013.01); C23C 16/0209 (2013.01);
Abstract
A film coating apparatus for coating a patterned roller using an atomic layer deposition process includes a deposition chamber and a heater. The deposition chamber defines an inlet and an outlet. The inlet is misaligned with the outlet. The heater is received in the deposition chamber. The heater includes a number of coiled filaments each formed into a generally circular loop. The filaments are spaced from each other and surrounds the patterned roller. The filaments are configured for heating the patterned roller.