The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 22, 2014

Filed:

Nov. 19, 2012
Applicant:

Basf SE, Ludwigshafen, DE;

Inventors:

Roland Reichenbach-Klinke, Traunstein, DE;

Thomas Pfeuffer, Haβfurt, DE;

Kati Schmidt, Shanghai, CN;

Thomas Ostrowski, Mannheim, DE;

Reinhold J. Leyrer, Dannstadt-Schauernheim, DE;

Yulia Fogel, Traunstein, DE;

Stefan Friedrich, Garching, DE;

Peter Gaeberlein, Magdeburg, DE;

Andrea Orleans, Trostberg, DE;

Manfred Schuhbeck, Traunstein, DE;

Marcus Guzmann, Mühlhausen, DE;

Marcus Rösch, Oppenheim, DE;

Bjorn Langlotz, Trostberg, DE;

Assignee:

BASF SE, Ludwigshafen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 8/588 (2006.01); E21B 43/16 (2006.01); C08F 230/02 (2006.01); C08F 220/56 (2006.01); C08F 220/26 (2006.01); C08F 228/02 (2006.01);
U.S. Cl.
CPC ...
C09K 8/588 (2013.01); C08F 230/02 (2013.01); C08F 220/56 (2013.01); E21B 43/16 (2013.01); C08F 220/26 (2013.01); C08F 228/02 (2013.01);
Abstract

Water-soluble, hydrophobically associating copolymers which comprise new types of hydrophobically associating monomers. The monomers comprise an ethylenically unsaturated group and a polyether group with block structure comprising a hydrophilic polyalkylene oxide block which consists essentially of ethylene oxide groups, and a terminal, hydrophobic polyalkylene oxide block which consists of alkylene oxides with at least 4, preferably at least 5 carbon atoms.


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